Nyacol Introduces Ce120/10 for Ceramics and Precision Polishing Applications

ASHLAND, MA – Nyacol® Nano Technologies, Inc. is pleased to introduce Ce120/10 which is a next generation colloidal cerium oxide dispersion with a mean particle size of 100 – 140 nm.

NYACOL Ce120/10 can be used as an abrasive for STI and ILD CMP processes, and for precision polishing of glass, quartz, displays and glass hard disks. Ce120/10 provides high removal rates at low solids concentration enabling a highly cost effective polishing slurry.

Please contact NYACOL to request a sample or with questions regarding its use in your specific application.

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