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Polishing

NYACOL® offers colloidal alumina, ceria, silica and zirconia for polishing applications. NYACOL® generally supplies the abrasive as a raw material for formulating slurries, but in some cases the dispersion can be used as supplied.

For the polishing of silicon wafers, NexSil 85-40 and 125-40 are recommended as the abrasive for stock polish slurries.

For STI and ILD CMP processes, cerium oxide is used.  NYACOL® Ce120/10 is calcined ceria and is being offered as an abrasive for high selectivity STI slurries.

For ILD slurries, NexSil 85K-40 is the preferred abrasive for the formulation of ILD slurries. NexSil 85K-40 provides competitive performance with other colloidal silicas or fumed silica based slurries. We can provide a ready to use slurry if required.  Ce120/10 can also be used in place of silica for ILD slurries.  The solids loading of cerium oxide is much lower than colloidal silica for the same removal rate.

  • Product Name Wt. % Oxide Particle Size Carrier Applications
  • NexSil™ 85K-40 40 50 nm Water Intended as an abrasive for formulated polishing slurries. Download
    Data Sheet
  • NYACOL® Ce120/10 10 100-140 Water Well-crystallized cerium oxide for use as an abrasive for STI and ILD CMP processes and for precision polishing of glass, quartz, displays and glass hard disks. Download
    Data Sheet

CMP is a complicated area and the choice of abrasive depends on the film or films being polished and the requirements of the applications. Our colloidal silica acid sols are typically a good choice for starting the formulation of the slurry and we can assist with custom chemistry for your application.

Sapphire and silicon carbide are hard wafer/film materials which are surprisingly polished successfully with colloidal silica. NexSil 85-40 and 125-40 are good choices for sapphire wafer polishing. We can provide expected results for C-plane and A-plane sapphire. Silicon carbide requires special chemistry to be used with our 85-40 and 125-40 abrasives, please contact NYACOL® to discuss.

We also offer specialty abrasives for GaAs, germanium, InP and other compound semiconductors.

Looking for More Options?

In some cases our standard materials are not suitable for a customer’s particular application, or a different composition is required. In these cases, we will consider a custom development project with our customers. We generally proceed under a Non-Disclosure Agreement and we will do the project in such a way that the material can be readily scaled up.

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